SurfaceScience21 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 93: Poster Session VII: Graphene and beyond I
O 93.14: Poster
Donnerstag, 4. März 2021, 10:30–12:30, P
Catalytically assisted growth of molybdenum disulfide monolayers on silicon dioxide substrates — Ana Burgos1, Valeria Del Campo1, and •Patricio Häberle1,2 — 1Departamento de Física, Universidad Técnica Federico Santa María, Valparaíso 2390123, Chile — 2Institute of Applied Physics, Vienna University of Technology, 1040 Vienna, Austria
MoS2 monolayers grown by chemical vapor deposition (CVD), starting from MoO3 and S precursors, occurs mostly in form of patches over the substrates, leaving some sections nearly clean. There is a large heterogeneity of the resulting products, regarding size and shape of the structures, obtained. We have explored, the formation of MoS2 layers grown by CVD on silicon dioxide substrates, while exposed to HOPG (Highly Oriented Pyrolytic Graphite). HOPG provides a catalytic surface that promotes the chemical reactions involved in the formation of MoS2. We have proposed a detailed model of the chemical reactions involved in this monolayer growth. It proceeds via the formation of MoO2 on the HOPG surface, followed by the gas phase synthesis of MoS2, which is subsequently collected over the substrate. Our analysis, using optical microscopy and Raman spectroscopy of the resulting products, indicate that the ratio between MoO2 and S is a crucial variable in the formation of monolayers. A set of optimal experimental conditions were established in order to promote homogeneous growth of MoS2 monolayers.