Mainz 2022 – scientific programme

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P: Fachverband Plasmaphysik

P 1: Invited talks I

P 1.1: Invited Talk

Monday, March 28, 2022, 11:00–11:30, P-H11

Plasma Physics in EUV Lithography — •Iris Pilch — Carl Zeiss SMT GmbH, Oberkochen, Germany

Extreme Ultraviolet (EUV) lithography is a technology for high volume manufacturing of semiconductors. The scanners operate at a wavelength of 13.5 nm. The main parts of a scanner are the EUV light source, the illumination optics, the mask, the projection optics and the wafer stage.

The EUV source of a scanner is a laser-produced plasma (LPP) delivering high power, which is needed to ensure productivity of the maschine. For metrology applications, EUV sources with moderate or even low powers are sufficient, and both technologies LPP and discharge-produced plasmas (DPP) are common.

In this talk, an overview on EUV lithography and its next development will be given, and the different EUV source types as well as the challenges of EUV light generation will be described.