Dresden 2026 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
CPP: Fachverband Chemische Physik und Polymerphysik
CPP 58: Gels, Polymer Networks and Elastomers III
CPP 58.2: Talk
Friday, March 13, 2026, 11:45–12:00, ZEU/0255
Deciphering the photopolymerization-induced nanostructure and interface formation for submicron additive manufacturing — •Shouzheng Chen1,2,3, Yufeng Zhia2, Lixing Li1, Sarathlal Koyiloth Vayalil2, Rolf A.T.M. van Benthem4, Johan F.G.A Janssen5, Mats K. G. Johansson6, Peter Müller-Buschbaum1, and Stephan V. Roth2,6 — 1TUM School of Natural Sciences, Chair for Functional Materials, Garching, Germany — 2DESY, Hamburg — 3MLZ, TUM, Garching, Germany — 4TU/e, Eindhoven, the Netherlands — 5Covestro (Netherlands) B.V., Geleen, the Netherlands — 6Department of Fibre and Polymer Technology, KTH, Stockholm, Sweden
UV-curing is widely used in additive manufacturing due to its controllable spatiotemporal characteristics. In submicron additive manufacturing, the involvement of solvents and limitations on film thickness complicate the precise regulation of nanostructures and interlayer interface. By using grazing incidence small angle X-ray scattering (GISAXS) and employing the oligomer (urethane dimethacrylate, UDMA)/monomer (2-ethylhexyl acrylate, 2-EHA) based resin system, we quantify the heterogeneous distribution of UDMA- and 2-EHA-rich nanodomains (around 23 nm and 13 nm in radii, respectively) in the cured system. Combining Bornagain, we reveal the buried "frozen" nano-wrinkles at interlayer interfaces(cones with radius of 70 nm, slope angle of 18°) induced by solvent and constraint stress synergistically. Our findings offer deeper insights for high precision submicron additive manufacturing.
Keywords: UV-curing; Nanostructures; Interface formation; GISAXS