Dresden 2026 – scientific programme

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DS: Fachverband Dünne Schichten

DS 9: Thin Film Properties III: Oxides

DS 9.1: Talk

Tuesday, March 10, 2026, 14:00–14:15, REC/C213

Analysis of the MgF₂ || VO₂ Interface in Applications as Smart Windows by Secondary Ion Mass Spectrometry (SIMS) — •Yan Ravil Wollenweber-Bienerth, Peter J. Klar, Anja Henss, and Martin Becker — Institute of Experimental Physics I and Center for Materials Research, Heinrich-Buff-Ring 16, Justus-Liebig-Universität Giessen, D-35392 Giessen, Germany

Smart Windows are special fenestration devices whose transmittance switches as a function of the ambient temperature. Vanadium dioxide (VO₂) is by far the most studied material for such applications. Usually, high substrate temperatures are needed to obtain VO₂ thin films. This results in detrimental diffusion of alkaline ions from the substrate into the thermochromic layer. Buffer layers between the substrate and the VO₂ may prove a suitable option for reducing this effect. Additionally, these help to increase visible transmittance and, in case of rutile materials, yield a reduction of the VO₂ growth temperature. Magnesium fluoride (MgF₂) is one viable candidate thanks to its excellent optical properties and chemical resistance. Simulations, however, show a significant influence of the interfaces between the layers on various properties. By controlling interface morphology, an improvement of the layer properties can be anticipated.

Here, we utilize SIMS depth-profiling to analyze multi-layer stacks of VO₂ and MgF₂ grown by ion-beam sputter deposition (IBSD). The stacks werde deposited on quartz glass substrates with MgF₂ serving as buffer layer. We show that this type of buffer layer improves the layer properties.

Keywords: Smart Windows; vanadium dioxide; buffer layer; magnesium fluoride; SIMS