Dresden 2026 – scientific programme
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FM: Fachverband Funktionsmaterialien
FM 11: Poster Session Functional Materials
FM 11.36: Poster
Tuesday, March 10, 2026, 18:00–20:30, P4
Smart DNA lithography as a tool for nanoelectronics — •Raufar Shameem1, Charlotte Kielar1, Christoph Hadlich2, Borja Rodriguez-Barea1, Ralf Seidel2, and Artur Erbe1 — 1Institute of Ion Beam Physics and Materials Research, HZDR, Dresden, Germany — 2Peter Debye Institute for Soft Matter Physics, University of Leipzig, Leipzig, Germany
Precise nanoscale patterning enables geometry-dependent functions across electrical, optical, and magnetic systems. DNA-templated hybrid lithography employs programmable molecular templates to define complex nanoscale shapes. Here, we use long DNA origami structures in a workflow integrating self-assembly, selective bottom-up oxide growth, and conventional top-down processing. The origami patterns form durable stencil masks on sapphire, guiding etching and metal deposition to create nanowire geometries beyond optical lithography. To generate these masks, DNA origami is assembled on sacrificial silicon, followed by controlled SiOx growth via chemical vapor deposition. Removing the DNA exposes nanowire-like and cavity-like oxide features that accurately reproduce the origami geometry and serve as robust patterning masks. AFM, SEM, and FIB cross sections verify shape transfer, growth behavior, and patterning resolution. This approach extends DNA-assisted lithography toward clean, versatile metal architectures for geometry-sensitive applications. It also improves integration with existing fabrication by providing stable masks, reliable shape transfer, and added flexibility in designing nanoscale features.
Keywords: DNA origami; nanolithography; hybrid patterning; stencil masks; pattern transfer