Dresden 2026 – scientific programme
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MA: Fachverband Magnetismus
MA 6: Magnetic Imaging Techniques I
MA 6.11: Talk
Monday, March 9, 2026, 12:15–12:30, POT/0361
Development of in-house high-yield in-situ TEM chip production with magnetic thin-films — •Sindre Vie Jørgensen1, Patrick R. B. Thomassen1, Trond Hauklien1, Marthe Linnerud1, Asle Sudbø1, David Barriet1, 2, and Magnus Nord1 — 1IFY, NTNU, Norway — 2NYB Partner DA
Transmission Electron Microscopy (TEM) is a powerful tool for studying materials at the nanoscale. For future device materials, being able to apply a biasing voltage during TEM imaging is highly advantageous for observing magnetic domain responses at the nanoscale. We have developed a 'frontside-then-backside' method to create in-situ biasing TEM chips for as-deposited thin-film samples. This creates 100+ chips from a 4'' Si wafer per production batch, which is highly customisable, allowing for multiple designs, TEM window dimensions, and circuit layouts simultaneously, with little variation in production time. This method has been tested with 20 nm thick, 5 um wide permalloy thin films with two narrow sections, 2,5 um wide, for a local increase in current density. Bias has been applied during magnetic Lorentz TEM (LTEM) to verify in-situ capabilities by shifting magnetic domain walls within the film via thermal excitation. This greatly expands the utility of the TEM for studying device-relevant magnetic materials, as simultaneous in-situ studies of the magnetics, structure and composition become possible.
Keywords: in-situ biasing; Nanofabrication; STEM-DPC; Magnetic Domain Walls; Multi-layered thin films