Dresden 2026 –
wissenschaftliches Programm
O 11: Metal & Semiconductor substrates: Adsorption and reaction of small molecules II
Montag, 9. März 2026, 15:00–17:00, HSZ/0401
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15:00 |
O 11.1 |
Ethylene on Si(001) revisited: New insights from XPS, STM, and Monte Carlo Simulations — •Jannick A. Peters, Sophie Göbel, and Michael Dürr
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15:15 |
O 11.2 |
The Influence of Doping on Inelastic H Atom Scattering from Silicon — •Malte Opfermann, Kerstin Krüger, Sophia Tödter, and Oliver Bünermann
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15:30 |
O 11.3 |
Ab initio insights into the OER activity of pristine and metal-supported Co3O4(111) — •Muhammad Munawar and Rossitza Pentcheva
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15:45 |
O 11.4 |
Through Stronger Hinderance to Higher Reactivity: Influence of the Alkyl Chains on the Activation Energy of Ether Cleavage on Silicon — Timo Glaser, Gustav F. Nolte, Tamam Bohamud, Philip Keller, Mathieu G. Silly, Hendrik Weiske, Ralf Tonner-Zech, and •Michael Dürr
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16:00 |
O 11.5 |
Frontier Orbitals Control Adsorbate Bonding to Stepped Transition Metal Surfaces — •Florian Nitz, Stefan Hörandl, Dmitriy Borodin, and Alec Wodtke
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16:15 |
O 11.6 |
Memory friction and zero-point motion in hydrogen surface diffusion — •George Trenins and Mariana Rossi
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16:30 |
O 11.7 |
When plasma meets surfaces - Nitrogen plasma-induced surface transformations on copper — •Ester Perez Penco and Roland Bliem
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16:45 |
O 11.8 |
From Gold to Copper: N-heterocyclic Carbene Self-Assembly for Area-Selective Deposition — •Franz Thiemann, Patrick Melix, Emmett Desroche, Francesco Tumino, Cathleen Crudden, and Ralf Tonner-Zech
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