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O: Fachverband Oberflächenphysik

O 19: Vacuum Science & Technology: Theory and Applications – Poster

Monday, March 9, 2026, 18:00–20:00, P2

18:00 O 19.1 Contact-Separation phenomenon at the Silica-Gold interface: AFM and ToF-SIMS insights — •Nisha Ranjan, Tolga Acartürk, Kathrin Küster, and Ulrich Starke
18:00 O 19.2 Simulation-Guided GIXPS: Planning faster (HA)XPS measurements while enabling depth-sensitivity — •David Capalbo, Oliver Rehm, Endrit Kusari, Andrei Gloskovskii, Christoph Schlueter, Lutz Baumgarten, and Martina Müller
  18:00 O 19.3 The contribution has been withdrawn.
18:00 O 19.4 Analysis of the charge distribution of an insulating sphere in contact electrification processes — •Andre Mölleken, Hermann Nienhaus, and Rolf Möller
18:00 O 19.5 Contact electrification between Au and hydrogen-passivated Si(111) surfaces — •Christian Gruber, Andre Mölleken, Tobias Prost, Hermann Nienhaus, and Rolf Möller
18:00 O 19.6 Towards nanoscale EUV spectroscopy of 2D heterostructures using interferometric coherent diffractive imaging — •Hannah Strauch, Jan Mädrich, Daniel Steil, Stefan Mathias, and G. S. Matthijs Jansen
18:00 O 19.7 Development of a Low Temperature Two-Level System Microscope for Superconducting Quantum Circuits — •David Mazibrada, Johannes Schwenk, Jürgen Liesenfeld, Hannes Rotzinger, Philip Willke, and Alexey V. Ustinov
18:00 O 19.8 Prospects of ARPES measurements in an external static magnetic field — Dmitry Usanov and •Daniil Yevtushynsky
18:00 O 19.9 New Electrospray Ion Beam Deposition source for wellcontrolled STM sample preparation — •Niclas Przibylla, Markus Etzkorn, Stephan Rauschenbach, and Uta Schlickum
18:00 O 19.10 Electronoptical Concept of ARPES and RIXS Combined in a Novel Photoelectron Microscope — O. Tkach, Y. Lytvynenko, C. Fawaz, T. Lacmann, S. Chernov, O. Fedchenko, H. Agarwal, M. Hoesch, J. K. Dey, J. Dilling, L. Bruckmeier, M. Scholz, J. Schunck, S. Roth, K. Rossnagel, M. Beye, M. Le Tacon, •G. Schönhense, and H.-J. Elmers
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