Dresden 2026 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

O: Fachverband Oberflächenphysik

O 29: Oxides and insulators: Adsorption and reaction of small molecules – Poster

O 29.3: Poster

Monday, March 9, 2026, 18:00–20:00, P2

Interaction of atomic Oxygen with Silica Surfaces — •Ahmad Kassem Arrak, Stephen Hocker, Hansjoerg Lipp, and Johannes Roth — FMQ, University of Stuttgart, Germany

In order to increase the lifetime of VLEO (very low earth orbit) satellites, the drag forces on the satellite and the degradation of the surface material must be reduced. Both arise mainly from atomic oxygen (AO) impinging on the satellite surfaces at hyperthermal velocities. We investigate the influence of AO impact on silica surfaces using molecular dynamics simulations (LAMMPS). A focus is on adsorption, reflection and chemical reactions. Three interaction potentials were used, one from Vashishta, a Tersoff potential and a PACE machine learning potential. We prepared three (001) surface structures of alpha silica differing by their surface layers. The oxygen impact simulations revealed that the interaction processes occurring at the surface depend strongly on the chemical composition of the surface layers. At the oxygen-rich surface the formation and desorption of O2 can be observed while reflection or adsorption of AO is favored at other surfaces.

Keywords: VLEO; molecular dynamics; interaction potentials; atomic oxygen; silicon oxide