Dresden 2026 – scientific programme
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O: Fachverband Oberflächenphysik
O 54: Nanostructured surfaces and thin films
O 54.4: Talk
Wednesday, March 11, 2026, 11:15–11:30, HSZ/0201
Current-driven Rb+ intercalation for on-chip tuning of superconductivity in RbxC60 thin films — •Konstantin Shchukin1,2, Oliver Gallego Lacey3, Baptiste Coquinot4, Jacek Jakowski5, Jingsong Huang5, Patrik Staudenmayer1, Yannic Falke2, Ram Prakash Pandeya1, and Alexander Grüneis1 — 1Institut für Festkörperelektronik, Technische Universität Wien, Gußhausstraße 25, 1040 Vienna, Austria — 2II. Physikalisches Institut, Universität zu Köln, Zülpicher Straße 77, 50937 Köln, Germany — 3CEA, Université Grenoble Alpes, IRIG-Pheliqs, 38000 Grenoble, France — 4Institute of Science and Technology Austria (ISTA), Am Campus 1, 3400 Klosterneuburg, Austria — 5Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831, USA
Superconducting fullerides are usually synthesised by thermal or solution intercalation of alkali ions, which limits control of stoichiometry. We use electro-intercalation to drive Rb+ into C60 thin films. Our on-chip setup combines in-situ growth, Raman spectroscopy and four-terminal transport, so that the stoichiometry x of RbxC60 is obtained from the Ag(2) mode and linked to the superconducting transition temperature Tc. By varying the Rb/C60 ratio, we tune the films to superconducting Rb3C60 and change Tc from 7 K to 26 K. Time-dependent Raman and transport data show that the Rb+ electro-intercalation follows Butler-Volmer-type kinetics. Electro-intercalation enables precise, on-chip control of superconductivity in ultrathin fulleride films and is extendable to other porous and layered materials.
Keywords: Ultra-high Vacuum; Raman; fullerene; Nanostructured films; electrointercalation