Dresden 2026 – scientific programme

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O: Fachverband Oberflächenphysik

O 68: Nanostructured surfaces and thin films – Poster

O 68.3: Poster

Wednesday, March 11, 2026, 18:00–20:00, P2

Nanostructured TiO₂ surfaces by low-energy ion erosion — •Berk Yildirim and Jens Bauer — Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, D-04318 Leipzig, Germany

Ripple nanostructures on titanium surfaces are explored as a means to enhance protein adsorption and potentially introduce directionality for implant applications. We aim to produce large areas of consistent nanostructuring on titanium surfaces. Firstly, titanium/titanium oxide thin films are deposited using argon ion beam sputtering (IBS), followed by low-energy oxygen ion etching at an angle to create the ripple structures. Four main parameters are used for control. 1 ) thin-film composition, adjusted by supplying a background oxygen during deposition to produce fully TiO₂ films, or by depositing without oxygen to obtain titanium films, 2 ) etching time, 3 ) etching ion beam energy, where we applied 1.4 kV and 800 V, and 4 ) etching ion beam incidence angle. The morphology was analysed using AFM, SEM, Thin-film Reflectometry and the composition using XPS, ToF-SIMS. At 80^∘, the shadowing effect dominates and produces ripples or nanoneedles aligned in the same direction as the beam, which we consistently observe across a 5 cm radius sample. Roughnesses of the unetched films were Sq = 1 nm (Ti) and Sq = 4.8 nm (TiOx). We obtain much rougher and larger structures on the titanium oxide thin films with Sq ≈ 15 nm, and smoother ripple structures on the titanium thin films with Sq ≈ 3 nm. Controlling etching time and beam voltage allows fine-tuning of roughness and topography.

Keywords: Nanostructure; Ripples; Ion Beam; Titania; Self-organization