Dresden 2026 – scientific programme

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O: Fachverband Oberflächenphysik

O 68: Nanostructured surfaces and thin films – Poster

O 68.5: Poster

Wednesday, March 11, 2026, 18:00–20:00, P2

Fabrication of Self-Assembled Carbon Nanodot Patterns on Quartz Glass Surfaces by Means of Ion Beam Processing — •Jamal Ghaith and Jens Bauer — Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, D-04318 Leipzig, Germany

Graphite Nanodot patterns can be used as a negative mask for subsequent etching of quartz glass surface to bring about anti-reflective properties required in high-power laser applications. This requires uniformity in size and distribution of the nanodots over large areas. Silicon wafers with a ∼200 nm thick thermal oxide layer are used as silica test sample material. A carbon layer is initially deposited using Ion Beam Sputtering (IBS), followed by 800 eV Argon ion etching at an angle, with sample rotation. The parameters used to control the nanodot formation are incidence angle of the ion beam, etch time, and carbon layer thickness. We found that an incidence angle of 70 degrees produces the most uniform nanodot distribution. Interestingly, increasing etch time does not necessarily lead to larger (or higher amplitude) dots. Instead of an increased size coalescence of the dots is observed, at least as long as the carbon layer thickness is high enough. The morphology was analysed using AFM and SEM, and the composition using ToF-SIMS.

Keywords: Nanostructure; Dots; Ion Beam; Carbon; Graphite