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Dresden 2026 – scientific programme

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O: Fachverband Oberflächenphysik

O 69: Nanostructures at surfaces:1D, 2D, networks – Poster

O 69.9: Poster

Wednesday, March 11, 2026, 18:00–20:00, P2

Effect of the catalytic-substrate and graphene-films on the growth and physical properties of non-stoichiometric silicon-oxide nanoparticles — •Mehmet Selim Imamoglu, Cem Kincal, and Oguzhan Gürlü — Istanbul Technical University, Istanbul, Turkey

It is well known that silicon-oxide particles form during the growth of graphene by chemical vapor deposition (CVD) in a quartz furnace. Our studies showed that the creation and structure of these particles is mostly governed by the hydrogen flow rate during growth. Moreover, we have proven that they can be covered by graphene films depending on their morphology; showing that graphene growth during CVD process can continue over a non-catalytic substrate. In this work we have further investigated the formation and physical properties of such nanoparticles. Our results indicated that CVD grown silicon-oxide nanoparticles have non-stoichiometric nature leading to photoluminescent behavior. In this presentation their structure and physical properties as a function of the growth substrate (Ni and Cu foils) and the existence or in-existence of graphene films will be discussed. We will also present the methodology to transfer these nanoparticles on to random substrates.

Keywords: silicon oxide; graphene; chemical vapor deposition; nanoparticle; lateral force microscopy

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