Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)
DS 44.9: Poster
Freitag, 30. März 2012, 09:30–12:00, Poster E
Silicon Nanoparticle Sprayed Films and Their Characterization by Ellipsometry, Raman Spectroscopy, and Atomic Force Microscopy — •Falko Seidel1, Iulia G. Korodi1, Stephan Koth2, Ronny Fritzsche3, Ovidiu D. Gordan1, Reinhard R. Baumann2, Michael Mehring3, and Dietrich R.T. Zahn1 — 1Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany — 2Institute for Print and Media Technology, Chemnitz University of Technology, D-09107 Chemnitz, Germany — 3Coordination Chemistry, Chemnitz University of Technology, D-09111 Chemnitz, Germany
The growth of single crystal Silicon (c-Si) for photovoltaic applications is an expensive, high temperature requiring process. Regarding thin film solar cells less expensive processes such as spray coating would be advantageous. In this work dispersions of silicon nanoparticles (Si NP) having nominal sizes of 6 nm and 40 nm dispersed in a solution are sprayed on 0.1 mm thick molybdenum foils. The spraying setup works in a glovebox under nitrogen atmosphere and an in-line spectroscopic ellipsometer (SE) enables to investigate optical properties during film deposition. In order to obtain microcrystalline Silicon (mc-Si), an high energetic light flash sinters the accumulated Si NP. Raman spectroscopy probes the sintering process while atomic force microscopy (AFM) probes the surface morphology and roughness. Eventually, results of these three methods are presented and discussed in the light of the potential of spray coating for producing low cost, large area photovoltaic devices.