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Verhandlungen
Verhandlungen
DPG

Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

Mo, 09:30–12:15 H 0111 DS 1: Layer properties: electrical, optical, and mechanical properties
Mo, 12:30–13:30 H 0111 DS 2: Nanoengineered thin films
Mo, 15:00–17:00 H 0111 DS 3: Focused electron beam induced processing for the fabrication of nanostructures I (focused session, jointly with O – Organizers: Huth, Marbach)
Mo, 09:30–10:00 H 2032 DS 4: Thin film photovoltaics
Mo, 10:00–11:00 H 2032 DS 5: Thin film photovoltaics: CIGSe + CdTe
Mo, 11:15–12:45 H 2032 DS 6: Thin film photovoltaics: CIGSe + processing
Mo, 15:00–16:15 H 2032 DS 7: Organic electronics and photovoltaics I (jointly with CPP, HL, O)
Mo, 16:30–18:00 H 2032 DS 8: Thin film photovoltaics: oxides and nanostructures
Mo, 09:30–12:45 EB 301 DS 9: Multiferroics I: Junctions and thin films / Magnetoelectric coupling (jointly with MA, DF, KR, TT)
Mo, 15:00–18:30 EB 301 DS 10: Multiferroics II: Hexagonal manganites / Incommensurate multiferroics (jointly with MA, DF, KR, TT)
Mo, 16:45–18:00 H 3005 DS 11: Multiferroics: Matter at low temperature (jointly with MA, DF, TT, KR)
Mo, 15:00–17:45 EB 202 DS 12: FePt Nanoparticles (jointly with MA, MM – Organizer: Farle)
Di, 09:30–11:30 H 0111 DS 13: Focused electron beam induced processing for the fabrication of nanostructures II (focused session, jointly with O – Organizers: Huth, Marbach)
Di, 11:45–12:45 H 0111 DS 14: Ion irradiation effects
Di, 09:30–11:15 H 2032 DS 15: Organic electronics and photovoltaics: simulations and optics I (jointly with CPP, HL, O)
Di, 11:30–13:00 H 2032 DS 16: Organic electronics and photovoltaics: simulations and optics II (jointly with CPP, HL, O)
Di, 09:30–12:45 EB 301 DS 17: Multiferroics III: Strain / New routes towards multiferroicity (jointly with MA, DF, KR, TT)
Di, 13:30–14:00 HE 101 DS 18: Gaede Prize talk (Mato Knez)
Di, 12:15–15:15 Poster A DS 19: Poster I: Multiferroics (jointly with MA, DF, KR, TT), Spins in organic materials (jointly with MA), FePt Nanoparticles (jointly with MA, MM)
Mi, 09:30–11:30 H 0111 DS 20: Application of thin films
Mi, 11:45–13:45 H 0111 DS 21: Micro- and nanopatterning (jointly with O)
Mi, 15:00–17:15 H 0111 DS 22: Trends in atomic layer deposition I (Focused session – Organizer: Nielsch)
Mi, 17:30–19:45 H 0111 DS 23: Trends in atomic layer deposition II (Focused session – Organizer: Nielsch)
Mi, 09:30–11:15 H 2032 DS 24: Organic electronics and photovoltaics: electronic properties I (jointly with CPP, HL, O)
Mi, 11:30–13:00 H 2032 DS 25: Organic electronics and photovoltaics: electronic properties II (jointly with CPP, HL, O)
Mi, 15:00–16:30 H 2032 DS 26: Thin film characterization: structure analysis and composition (Ion assisted methods and analysis)
Mi, 16:30–17:30 H 2032 DS 27: Thin film characterization: structure analysis and composition (post growth analysis XRD, etc..)
Mi, 17:45–19:45 H 2032 DS 28: Thin film characterization: structure analysis and composition (Spectroscopy)
Mi, 09:30–11:30 EB 407 DS 29: High-k and low-k dielectrics (joint session with DF)
Do, 09:30–11:00 H 0111 DS 30: Thin film characterization: structure analysis and composition (TEM, LEED, PAS)
Do, 11:15–13:00 H 0111 DS 31: Organic thin films I
Do, 09:30–11:00 H 2032 DS 32: Thermoelectric materials I (Focused session – Organizers: Meyer, Heiliger)
Do, 11:15–12:45 H 2032 DS 33: Thermoelectric materials II: Reduced dimensionality (Focused session – Organizers: Meyer, Heiliger)
Do, 15:00–17:30 H 2032 DS 34: Organic thin films II: Interface spectroscopy
Do, 17:45–19:30 H 2032 DS 35: Organic thin films III: Monolayers and crystals
Do, 16:45–19:00 H 1012 DS 36: Spins in Organic Materials (jointly with MA)
Do, 15:00–17:00 Poster E DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films
Do, 17:30–19:00 Poster E DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects
Fr, 09:30–10:45 H 0111 DS 39: Resistive switching I (jointly with DF, KR, HL)
Fr, 11:00–12:30 H 0111 DS 40: Resistive switching II (jointly with DF, KR, HL)
Fr, 09:30–11:15 H 2032 DS 41: Thermoelectric materials III: Heterostructures (Focused session – Organizers: Meyer, Heiliger)
Fr, 11:30–13:00 H 2032 DS 42: Thermoelectric materials IV: Glass, sintered materials (Focused session – Organizers: Meyer, Heiliger)
Fr, 13:30–16:00 H 2032 DS 43: Thermoelectric materials V: Bulk materials (Focused session – Organizers: Meyer, Heiliger)
Fr, 09:30–12:00 Poster E DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)
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DPG-Physik > DPG-Verhandlungen > 2012 > Berlin