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Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 23: Trends in atomic layer deposition II (Focused session – Organizer: Nielsch)

Mittwoch, 28. März 2012, 17:30–19:45, H 0111

17:30 DS 23.1 Hauptvortrag: Functional complex oxide materials by atomic layer deposition — •Maarit Karppinen
18:00 DS 23.2 Topical Talk: Uniform ZnMnO and ZnCoO films grown by Atomic Layer Deposition — •Marek Godlewski, Małgorzata Łukasiewicz, Aleksandra Wójcik-Głodowska, Elzbieta Guziewicz, and Bartłomiej Witkowski
18:30 DS 23.3 Topical Talk: Atomic layer deposition of oxide thin films for non-volatile memory applications — •Susanne Hoffmann-Eifert
19:00 DS 23.4 Investigation of Morphology and Resistive Switching in ZrO2/TiO2 Films Grown by Atomic Layer Deposition — •Irina Kärkkänen, Mikko Heikkilä, Jaakko Niinistö, Mikko Ritala, Markku Leskelä, and Susanne Hoffmann-Eifert
19:15 DS 23.5 ALD of metal oxides and fluorides for optical applications — •Matti Putkonen, Adriana Szeghalmi, Mato Knez, and Timo Sajavaara
19:30 DS 23.6 Thermoelectric Characterization of Sb2Te3 Thin Films Deposited by ALD — •Sebastian Zastrow, Christian Schumacher, Matthias Regus, Stephan Schulz, and Kornelius Nielsch
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