DS 23: Trends in atomic layer deposition II (Focused session – Organizer: Nielsch)
Mittwoch, 28. März 2012, 17:30–19:45, H 0111
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17:30 |
DS 23.1 |
Hauptvortrag:
Functional complex oxide materials by atomic layer deposition — •Maarit Karppinen
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18:00 |
DS 23.2 |
Topical Talk:
Uniform ZnMnO and ZnCoO films grown by Atomic Layer Deposition — •Marek Godlewski, Małgorzata Łukasiewicz, Aleksandra Wójcik-Głodowska, Elzbieta Guziewicz, and Bartłomiej Witkowski
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18:30 |
DS 23.3 |
Topical Talk:
Atomic layer deposition of oxide thin films for non-volatile memory applications — •Susanne Hoffmann-Eifert
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19:00 |
DS 23.4 |
Investigation of Morphology and Resistive Switching in ZrO2/TiO2 Films Grown by Atomic Layer Deposition — •Irina Kärkkänen, Mikko Heikkilä, Jaakko Niinistö, Mikko Ritala, Markku Leskelä, and Susanne Hoffmann-Eifert
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19:15 |
DS 23.5 |
ALD of metal oxides and fluorides for optical applications — •Matti Putkonen, Adriana Szeghalmi, Mato Knez, and Timo Sajavaara
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19:30 |
DS 23.6 |
Thermoelectric Characterization of Sb2Te3 Thin Films Deposited by ALD — •Sebastian Zastrow, Christian Schumacher, Matthias Regus, Stephan Schulz, and Kornelius Nielsch
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