Berlin 2012 –
wissenschaftliches Programm
DS 21: Micro- and nanopatterning (jointly with O)
Mittwoch, 28. März 2012, 11:45–13:45, H 0111
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11:45 |
DS 21.1 |
Investigation of the Fe incorporation in ion-beam induced patterning on Si (100) — •behnam khanbabaee, andreas biermanns, marina cornejo, dietmar hirsch, frank frost, and ullrich pietsch
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12:00 |
DS 21.2 |
Threshold sputter depth for nanopattern formation and "zero" sputter yield ion beam irradiation of amorphous carbon — •Omar Bobes, Kun Zhang, and Hans Hofsäss
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12:15 |
DS 21.3 |
Is silicide formation the decisive factor in impurity induced ion beam pattern formation? — Sven Müller, •Martin Engler, Frank Frost, and Thomas Michely
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12:30 |
DS 21.4 |
Innovative FIB specific Nanopatterning Strategies for Optimized Photonic Crystal Nanofabrication — •Frank Nouvertne and Achim Nadzeyka
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12:45 |
DS 21.5 |
(contribution withdrawn) Photonic Crystal Gratings for High-Speed Energy-Efficient Laser Sources — •Philip Wolf, Werner Hofmann, Norbert Grote, and Dieter Bimberg
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13:00 |
DS 21.6 |
Nanopatterning by molecular polygons — •Stefan-Sven Jester, Eva Sigmund, Natalia Shabelina, Stephan M. Le Blanc, and Sigurd Höger
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13:15 |
DS 21.7 |
Rapid Prototyping of Hierarchical Gecko-Mimicking Nano- and Microstructures using Multiphoton Absorption — •Michael Röhrig, Michael Thiel, Matthias Worgull, and Hendrik Hölscher
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13:30 |
DS 21.8 |
Time and space resolved pump-probe investigations on induced ablation of thin films with femtosecond laser pulses — •Stephan Rapp, Matthias Domke, and Heinz P. Huber
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