Parts | Days | Selection | Search | Downloads | Help

O: Oberflächenphysik

O 11: Poster (I)

O 11.41: Poster

Monday, March 23, 1998, 19:30–22:30, Bereich C

Simultaneous measurement of DC resistance and IR reflectance of adsorbate covered epitaxial copper films — •M. Hein¹, P. Dumas², A. Otto¹, and G. W. Williams³ — ¹Lehrstuhl für Oberflächenwissenschaft (IPkM), Heinrich Heine Universität, D-40225 Düsseldorf — ²LURE, Bâtiment 209D, Université Paris-sud, F-91405 Orsay, France — ³National Synchrotron Light Source, BNL, Upton, New York 11973

Simultaneaous broadband IR reflectance and DC resistivity measurements of (111)-oriented epitaxial copper films have been performed at the synchrotron IR beamline in Brookhaven. The focus of our studies was the connection between the DC resistivity change on one hand and the change in broadband IR reflectance on the other as function of exposure to CO and other adsorbates. We found a clear linear dependence in spite of different adsorption stages as function of exposure, as predicted by theory. The integrated intensity of the CO stretch mode at 2080 cm⁻¹ shows saturation with increasing coverage far before saturation of the resistance change. Further results obtained at the most recent runs will be communicated.