Münster 1999 – wissenschaftliches Programm

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VA: Vakuumphysik und Vakuumtechnik

VA 4: Vakuumverfahrenstechnik II

VA 4.4: Hauptvortrag

Dienstag, 23. März 1999, 11:50–12:30, ZH

The physics and applications of the liquid metal ion source — •Richard G. Forbes — University of Surrey, School for Electronic Engineering, Guildford, Surrey GU2 3XH, UK

A liquid metal ion source (LMIS) has a small source size and produces an optically bright ion beam. A Focused-Ion-Beam (FIB) system can focus this beam into a small area. FIB systems have various applications in the areas of metal deposition and ion beam milling. The LMIS is a device driven by a negative hydrostatic pressure, and there is some very interesting physics involved. The principles are now well understood, although some of the detail is unclear. Recent developments focus on links between LMIS theory and the theory of electrohydrodynamic (EHD) spraying. This lecture will survey some of the applications of the LMIS, will identify some of the factors that affect the performance of FIB systems, and will summarise our current understanding of how the LMIS works.