Regensburg 2000 – wissenschaftliches Programm
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M: Metallphysik
M 11: Wasserstoff in Metallen
M 11.6: Vortrag
Donnerstag, 30. März 2000, 11:45–12:00, H16
RBS and XPS Sputter Depth Profiling at the Pd/Y interface* — •Gregor Neuert1,2, Richard J. Smith2, and Juergen A. Schaefer1 — 1Institut fuer Physik, Technische Universitaet Ilmenau, Ilmenau, Germany — 2Physics Department, Montana State University, Bozeman, MT, USA
X - ray photoelectron spectroscopy (XPS) sputter depth profiling and Rutherford Backscattering Spectroscopy (RBS) are used to study the Pd / Y interface. This interface is of interest because of recent work showing that Pd capped -films exhibit a reversible metal insulator transition as a function of H content in the film. The yttrium film was first evaporated on a glass substrate. A palladium layer was then evaporated on the top of the yttrium film. Both films are made by thermal evaporation using a tungsten basket with a boron - nitride crucible as heating shield. RBS is used to measure the thickness of the ilm and to calibrate the sputter rate for pure Pd and Y. Palladium 3d photoelectron peaks, measured by XPS, show a core level shift to higher binding energies with sputter depth. This chemical shift can be an indication of alloy formation at the Pd / Y interface. The alloy formation on the Pd / Y Interface also depends on the oxygen concentration in the Yttrium film.
*Work supported by NSF DMR 97-10092 and NASA EPSCoR NCCW-0058