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Q: Quantenoptik

Q 17: Poster: Cooling and Trapping

Q 17.27: Poster

Wednesday, April 4, 2001, 12:30–15:00, AT2

Transverse Laser Cooling of an Indium Atomic Beam — •Jiayu Wang, Tobias Junglen, Mario Mützel, Dietmar Haubrich, and Dieter Meschede — Institut für Angewandte Physik, Universität Bonn, Germany

A new method for nanostructure fabrication using neutral atomic beams called atom lithography has been successfully demonstrated within the past several years. It applies a standing wave to focus atoms as they are deposited onto a substrate. Several atomic species have been focused. Our work concentrates on the optical manipulation of indium atom which is technologically interesting.

In one-dimensional focusing the deposited linewidth is primarily determined by the transverse collimation of the atomic beam. Therefore it is necessary to optically cool the transverse motion of the atomic beam before focusing.

Due to the atomic hyperfine structures two laser wavelengths (410nm and 451nm) must be utilized to close the cooling transition. 410nm is easily accessed with a simple GaN diode laser, and 451nm is available by utilizing a KNbO₃ crystal to frequency double a Ti:Sapphire laser. We present numerical simulations of transverse Doppler cooling of an Indium atomic beam. The results indicate that efficient laser cooling within this unusual two color laser cooling scheme should be experimental possible.