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DS: Dünne Schichten

DS 1: Oberfl
ächenmodifizierung I

DS 1.1: Hauptvortrag

Montag, 26. März 2001, 09:30–10:15, S 5.1

Ion Beam Ultra-Precision Surface Figuring — •Axel Schindler, Thomas Hänsel, Horst Neumann, and Bernd Rauschenbach — Institut für Oberflächenmodifizierung e.V. Leipzig, Permoserstr. 15, 04303 Leipzig

Ion beam figuring (IBF) and (Reactive) ion beam etching [(R)IBE] gain growing interest in precision optics technology, RIBE mainly for proportional transfer of 3D-resist mask structures in hard optical and optoelectronic materials and IBF for finishing and nanometer precision surface figuring.

Ion beam and plasma jet chemical etching (PJCE) techniques have been developed at IOM during the last decade. Some of these techniques have been proven to be mature for industrial production. The developmental work includes material related process tuning for high processing speed and minimum surface roughness and waviness. Processing algorithms for different surface figure requirements and special equipment have been developed. High rate processing RIBE and PJCE are under development for precision asphere fabrication and proportional transfer of 3D analogue microstructures, respectively.

The talk gives an overview of precision engineering techniques focusing on the status of ion beam and plasma techniques for surface figuring and polishing. The status of RIBE 3D-mask proportional transfer, e.g. for micro-lens arrays and blazed fresnel lens structures will be summarized.

R&D results obtained by the techniques described above including special equipment development and a discussion of the technological advantages and limitations will be given.