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O: Oberflächenphysik
O 25: Postersitzung (Grenzfl
äche fest-flüssig, Methodisches, Nanostrukturen, Organische Dünnschichten, Rastersondentechniken, reine Oberfl
ächen, Teilchen und Cluster, Zeitaufgelöste Spektroskopie, Sonstiges)
O 25.59: Poster
Mittwoch, 28. März 2001, 15:00–18:00, Foyer zu B
Plasmon enhanced Brillouin scattering from lithographically designed line structures — •Reinhold Eberle and Martin Pietralla — Albert-Einstein-Allee 11, Universität Ulm, 89081 Ulm
Line structures in the range from 4 µm down to 500 nm line width
were investigated with plasmon resonance and Brillouin
spectroscopy. The structures were produced by spincaoting a
standard PMMA resist on a thin silver layer. The line
structure was written using electron beam lithography.
The structures show several plasmon resonances depending on the
incident angle and the propagation direction with respect to the
lines.
Some of these resonances were used for Brillouin scattering.
These Brillouin spectra also show different features:
Above 2 µm and parallel to the lines there is a single Rayleigh
wave like in the case of a pure silver surface. Perpendicular to
the lines one can see several peaks. These peaks are assigned to
different dispersion branches and discussed in the repeated zone
scheme.