Hamburg 2001 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

TT: Tiefe Temperaturen

TT 4: Josephson Kontakte

TT 4.4: Vortrag

Montag, 26. März 2001, 15:30–15:45, J

Deep submicron intrinsic Josephson junctions on Tl-2212 epitaxial films. — •Yuri Koval¹, Andreas Franz¹, Paul Müller¹, and Henrik Schneidewind² — ¹Physikalisches Institut III, Universität Erlangen-Nürnberg, D-91058 Erlangen — ²Institut für Physikalische Hochtechnologie, D-07702 Jena

The preparation of small dimension stacked Josephson junctions is a task which is extremely interesting to explore charging effects and dynamics of charge solitons. HTS stacked junctions have a serious advantage in comparison with artificial junction arrays as they have an extremely small stray capacitance. The preparation of such junctions on epitaxial films is also rather attractive, as the Josephson junctions can be integrated with other devices, which is important for RF applications. We developed a new technology of preparation of stacked Josephson junctions, which has allowed us to obtain junctions with a size as small as 0.2×0.2 µ m². The most important innovation is the use of polymer PMMA for isolation. The junctions have current densities of up to 30 kA/cm² and transition temperatures of up to 106 K. The reduction of size results in additional features, which can be explained by dimensional effects. We expect that our technique will allow the preparation of devices with structure sizes of less than 100 nm.