Hamburg 2001 – scientific programme

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VA: Vakuumphysik und Vakuumtechnik

VA 1: Vakuumverfahrenstechnik: EUV-Lithografie

Monday, March 26, 2001, 09:30–10:50, R221

	09:30	VA 1.1	Invited Talk: Der Weg zur EUV-Lithografie — •Wolfgang Rupp
	10:10	VA 1.2	Invited Talk: Optical Lithography at 157 nm and the impact on the performance of photoresists — •Wolfgang Radlik