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P: Plasmaphysik

P 23: Poster: Plasmatechnologie, Plasma-Wand-Wechselwirkung, Staubige Plasmen, Plasmadiagnostik

P 23.27: Poster

Wednesday, March 20, 2002, 17:40–18:40, HZO Foyer

Comparison between Langmuir probe measurements and modeling of an inductively coupled Ar discharge in a GEC reference cell — •S. Vikram Singh, Yuri Ivanov, and Henning Soltwisch — Institute for Experimental Physics V, Ruhr University Bochum

The electron energy distribution function (EEDF) and electron density profiles are measured in an inductively coupled Ar discharge in the pressure range from 0.4 to 10 Pa for the power ranging up to 300 W. All measurements are performed in a Gaseous Electronics Conference (GEC) rf (13.56 MHz) reference cell under bright discharge mode (ICP - H-mode) with a movable Langmuir probe system. The measurements are made for three different axial positions between the antenna coil and the grounded electrode. At these positions radially resolved profiles are obtained by radial movement of the probe head. The measured profiles are compared with two model calculations, firstly with a "Global" model based on a simplified power balance for ion loss and production and, secondly, with a more detailed 2-D, stationary simulation of the plasma parameters. The later model is based on the solution of the fluid model, Boltzmann equation and Maxwells equations.

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