Regensburg 2002 – wissenschaftliches Programm
SYPF 2.35: Poster
Donnerstag, 14. März 2002, 09:00–18:00, Poster B
Breaking the polymer chains in Dynamic Plowing Lithography — •Brunero Cappella and Heinz Sturm — Bundesanstalt fuer Materialforschung und -pruefung - 12205 Unter den Eichen Berlin
Two different methods of nanolithography, namely Dynamic Plowing Lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methyl methacrylate) and polystyrene. The most important difference is that in DPL the border walls that surround the lithographed structures are very much bigger than the border walls created through FDI. The physico-chemical properties of the border walls created through DPL have been investigated. Several experimental data reveal that such border walls are very much softer and looser than unmodified polymers and prove that DPL is able to change the density of the polymer. This does not happen with FDI, where border walls are simply made up of the material carved out by the tip. Measurements of the adhesion with AFM and SEC measurements prove that DPL is also able to break the polymer chains. The energy dissipated by the AFM tip in the polymer during DPL has been measured, in order to confirm this hypothesis.