Regensburg 2002 – wissenschaftliches Programm
SYPF 2.5: Poster
Donnerstag, 14. März 2002, 09:00–18:00, Poster B
Dewetting of thin polymer films on rough silicon surface. — •Pylyp Volodin1, Alexander Sidorenko1, Peter Mueller-Buschbaum2, Sergej Minko1, and Manfred Stamm1 — 1Institut fuer Polymerforschung Dresden e.V. Hohe Str. 6, 01069 Dresden — 2Technische Universitaet Muenchen, Physik-Department, James-Franck-Str.1, 85747 Garching
The suppression of dewetting of thin polymer films is of great importance to a number of applications. This fact caused significant interest in investigation of the polymer dewetting. The spinodal dewetting mechanism on smooth uniform solid surface was investigated intensively in theory and experimentally in the last two decades. Another mechanism, dewetting on defects, is the alternative to spinodal one. Though there are a number of papers devoted to dewetting on defects, many points of this process are out of the consideration yet. Our interest to dewetting on defects is stimulated by promising perspectives of use of dewetting and microphase separation on ordered nanodefects for nanolithography. We study the dewetting of thin (25-30 nm) polystyrene film on silicon surface with roughened (rms ranged from 1 to 10 nm on 10x10 um2) surface during the annealing. The formation and development of nuclei is monitored by AFM / tapping mode. Here, we present the results of rates of nucleation and growth as a function of surface roughness. Also, we analyze the shapes of holes and surface defects causing the nucleation. The comparison of the parameters of the dewetting on surface defects with the spinodal dewetting on smooth uniform surface is done.