Aachen PK 2003 – wissenschaftliches Programm

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K: Kurzzeitphysik

K 2: Pulsed power technology

K 2.1: Vortrag

Mittwoch, 19. März 2003, 11:30–11:45, F04

Hollow cathode triggered pinch plasma as radiation source in the extreme ultraviolet and soft x-ray range — •Klaus Bergmann — Fraunhofer Institute for Laser Technology, Steinbachstr. 15, 52074 Aachen

A pinch plasma created in a pseudospark like electrode geometry - the hollow cathode triggered pinch plasma - is known as an intense emitter of radiation in the extreme ultraviolet spectral range around a photon energy of 100 eV. This concept of a gas discharge based radiation source is currently under investigation as a potential source for the extreme ultraviolet lithography making use of radiation at 13.5 nm. Using xenon as broadband emitter in the spectral range from 10 to 16 nm conversion efficiencies of electrical energy into EUV radiation of up to 10 %/(4 π sr) have been demonstrated. Such sources are typically operated with pulse energies of a few Joule of electrically stored energy and repetition rates of more than 3 kHz. The current pulse has a typical duration of 100 ns and the peak current ranges between 10 and 20 kA for conditions which lead to optimum emission around 13.5 nm.

This paper will give a discussion of scaling this gas discharge concepts to lower wavelengths with special interest to the water window (2.3 nm - 4.4 nm). The necessary plasma parameters for effective emission at lower wavelengths and their technological realisation in this gas discharge concept will be presented.