Aachen PK 2003 – wissenschaftliches Programm
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P: Plasmaphysik
P 15: Low Temperature Plasmas, Plasma Technology
P 15.2: Vortrag
Donnerstag, 20. März 2003, 15:50–16:10, FO1
Characterisation of a cascaded discharge setup by UV-VIS-spectroscopy — •Michael Heise1, Oliver Franken2, Thomas Lierfeld2, and Willi Neff1 — 1Fraunhofer Institut Lasertechnik, Aachen, Germany — 2Lehrstuhl f"ur Lasertechnik, RWTH Aachen, Aachen, Germany
Plasmas, especially dielectric barrier discharges, emit characteristic spectra of visi-ble and ultraviolet light whereas the spectral composition is determined mainly by the discharge gas, for example nitrogen or argon. The emitted spectral power density of the discharge in the UV range is dependent on power input and on the type of setup itself. In a suitable arrangement of two discharge gaps the UV emission of the first discharge can lead to an increased UV conversion efficiency in the second discharge. This will be demonstrated through results of measure-ments of power input via Lissajou method in conjunction with UV-VIS-spectroscopy.