Aachen PK 2003 – wissenschaftliches Programm

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P: Plasmaphysik

P 2: Heavy Ion Physics

P 2.2: Vortrag

Montag, 17. März 2003, 16:05–16:25, FO2

The pinch plasma phase of the Philips extreme UV source — •Thomas Kruecken — Philips Research Laboratories Aachen

Next generation microlithography requires intense radiation sources in the EUV wavelength range near 13.5 nm. One of the leading source concepts for future EUV lithographic tools is the Philips EUV source based on a hollow cathode triggered pinch discharge.

The EUV radiation is typically emitted by highly ionised heavy atoms like Xe+10. A model has been developed which solves the electrical circuit equations together with the differential equations describing the pinch plasma. The plasma is modelled by a coupled system of differential equations describing the magnetic compression in a snowplough-shock formulation, energy balances for ions and electrons including ratiation, transient ionisation and axial particle losses.

As the results of the simulations agree remarkably well with the experimental observations, the model could be used to optimize the radiation output of the Philips EUV source in the wanted wavelength region.