Dresden 2003 – scientific programme

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O: Oberflächenphysik

O 12: Postersitzung (Struktur und Dynamik reiner Oberfl
ächen, Grenzfl
äche fest-flüssig, Nanostrukturen, Teilchen und Cluster, Halbleiteroberfl
ächen und Grenzfl
ächen, Zeitaufgelöste Spektroskopie, Rastersondentechniken, Methodisches)

O 12.17: Poster

Monday, March 24, 2003, 18:00–21:00, P1

Nanolithography via color centers on insulating thin films — •Volkmar Zielasek, Svend Vagt, and Herbert Pfnür — Institut für Festkörperphysik, Universität Hannover, Appelstr. 2, D-30167 Hannover

As demonstrated by electron energy loss spectroscopy, electron irradiation of ultrathin epitaxial NaCl and MgO films leads to the formation of surface color centers [1][2] which determine, e.g., the chemical reactivity of the surface to a large extent. Selective nucleation of metal islands at these point defects can be used for creating well-ordered arbitrarily shaped metal-on-insulator nanostructures if the density of color centers on the surface can be modulated with high spatial resolution. We will present an evaluation of a new type of electron beam lithography in UHV based on surface color center patterns. Our experiments are performed in a combined system of scanning electron microscopy (1-25 keV energy) and scanning tunneling microscopy, enabling us to operate at sample temperatures in the range 80 - 900 K.

[1] V.Zielasek, T.Hildebrandt, M.Henzler, Phys.Rev.B 62(2000)2912.

[2] J.Kramer, W.Ernst, C.Tegenkamp, H.Pfnür, Surf.Sci. 517(2002)87.