Kiel 2004 – wissenschaftliches Programm

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P: Plasmaphysik

P 10: Postersitzung: Niedertemperaturplasmen Plasmatechnologie II, Staubige Plasmen II, Magnetischer Einschluss II

P 10.12: Poster

Dienstag, 9. März 2004, 17:45–19:30, Foyer

Influence of atomic hydrogen on a:C-H film properties — •Olivera Stepanovic, Johannes Berndt, and Jörg Winter — Experimentalphysik II, Ruhr-Universität Bochum

Amorphous carbon films (a-C:H) have found a great number of industrial and technical applications. They are widely used as protective coatings on optical devices, as wear resistant coatings etc. Depending on the deposition conditions (gas composition, ion energy etc.) the films can vary from soft polymer-like to hard hydrogen free diamond-like carbon films (DLC). Although they are intensively invesigated during the last 30 years the understanding of their growth mechanism is still not well understood. For the investigation of deposition processes the expanding and ICP/CCP plasmas are used with an additional hydrogen atom source. The deposited films are characterized by means of ex-situ ellipsometry, Raman spectroscopy, XPS, RBS, NRA and AFM. This work was partially supported by the DFG in the frame of SFB 591 and by BMBF in the frame of the project FKZ 13N 8049.