Kiel 2004 – wissenschaftliches Programm
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P: Plasmaphysik
P 3: Postersitzung: Niedertemperaturplasmen Plasmatechnologie I, Diagnostische Methoden I
P 3.21: Poster
Montag, 8. März 2004, 17:45–19:30, Foyer
On the influence of argon addition on microwave hydrogen plasmas obtained under moderate pressure conditions — •Andrei V. Pipa1, Guillaume Lombardi2, Xavier Duten2, Khaled Hassouni2 und Jürgen Röpcke1 — 1INP-Greifswald, 17489 Greifswald, Germany — 2LIMHP, CNRS-UP 1311 Universite Paris-Nord, 93430 Villetaneuse, France
Moderate-pressure hydrogen plasmas are of great interest in many thin film deposition processes. In such plasmas hydrogen is usually processed as the major component in a mixture involving other gases. In particular, argon is often used either as an active component of the gas mixture or as a probing species that can help via its emission to characterize the plasma and monitor the processes. In this last case, often a small admixture of Ar is considered as not influencing plasma parameters. The aim of this work was to investigate the validity of this assumption in the case of moderate pressure argon-hydrogen microwave discharges. For this purpose a one-dimensional non-equilibrium transport model for this discharge type was developed. This model was used to determine the spatial distribution of the main plasma parameters such as gas temperature, species densities and electron temperature. Results showed that a small amount of Ar (less then 1%) can considerably affect the density of atomic hydrogen, and even the gas temperature for specific discharge conditions. The collision and transport phenomena leading to this non linear effect of argon have been investigated by analyzing the contribution of Ar on the different hydrogen dissociation channels.