Regensburg 2004 – wissenschaftliches Programm
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DF: Dielektrische Festkörper
DF 6: Nanostrukturen, Schichten und Keramiken
DF 6.6: Vortrag
Donnerstag, 11. März 2004, 11:50–12:10, H11
First investigations of MIM capacitors using Pr2O3 dielectrics — •Christian Wenger, Gunther Lippert, Hans-Joachim Muessig, Peter Zaumseil, Roland Sorge, and Jaroslaw Dambrowski — IHP Microelectronics GmbH, Im Technologiepark 25, 15236 Frankfurt (Oder)
Metal-insulator-metal(MIM) capacitors with Pr2O3 as high-k material have been investigated for the first time. The results show that Pr2O3 MIM capacitors can provide higher capacitance densities than Si3N4 MIM capacitors while still maintaining comparable voltage coefficients of capacitance. The Pr2O3 dielectric material seems to be suitable for use in silicon RF applications.