Parts | Days | Selection | Search | Downloads | Help

DS: Dünne Schichten

DS 14: Schichtwachstum

DS 14.2: Talk

Wednesday, March 10, 2004, 14:45–15:00, HS 32

In-situ x-ray diffraction during sputtering of Shape Memory Alloy (SMA) Ni-Ti thin films — •R.M.S. Martins^1,2, N. Schell¹, F.M.B. Fernandes², and R. Silva² — ¹Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, P.O. Box 510119, D-01314 Dresden, Germany — ²CENIMAT, Campus da FCT/UNL, 2829-516 Monte de Caparica, Portugal

Ni-Ti thin films present great advantages for the fabrication of micro-actuactuators. The phase transformation and precipitation which are responsible for the shape memory effect have been widely studied in bulk material and thin films. However, in-situ studies have been limited to the aging/annealing treatments after deposition. In-situ study of the sputter deposition of Ni-Ti thin films has not yet been reported. Thus a magnetron sputter deposition chamber has been installed into the six-circle diffractometer of the ROssendorf BeamLine (ROBL-CRG) at the ESRF, Grenoble [1], and in consequence the crystallization kinetics have been followed in situ by x-ray diffraction during sputter deposition of Ni-Ti thin films.

[1] W. Matz, N. Schell, J. Bøttiger et al., Rev. Sci. Instr. 72, 3344 (2001)