Regensburg 2004 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 4: Prozesscharakterisierung

DS 4.3: Vortrag

Montag, 8. März 2004, 16:30–16:45, HS 31

Nanostructure Development in Compound, Magnetron-Sputtered PVD Thin Films — •Vladislav Spassov, Alan Savan, and Henry Haefke — CSEM Swiss Center for Electronics and Microtechnology, Inc., Rue Jaquet-Droz 1, CH 2000, Neuchatel, Switzerland

Nanostructured PVD thin films are newly emerging materials with a great potential in diverse applications such as for mechanical (e.g. tribological), chemical (e.g. catalyst), optical (i.e. photosensitive films), electronic (e.g. nonvolatile memory devices) coatings. A better understanding of how the nanostructure of a growing thin film forms, is a key factor in controlling and engineering the architecture of new materials and to make the best use of their properties. We have studied the development of nanocomposite thin films in the system TiAlCN-MoS2 deposited by nonreactive sputtering from segmented ceramic targets. The influence of the chemical composition and deposition parameters on the structure is studied with transmisiion electron microscopy and energy-dispersive X-ray spectroscopy.