Regensburg 2004 – wissenschaftliches Programm

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HL: Halbleiterphysik

HL 39: Hauptvortrag Kaiser

HL 39.1: Hauptvortrag

Donnerstag, 11. März 2004, 14:30–15:15, H15

The Dramatic Developments of Optical Lithography — •W. Kaiser — Carl Zeiss SMT AG, 73446 Oberkochen

Lithography is the key technology in the chip manufacturing process to enable continuous shrinking of electronic components on modern ICs, resulting in cheaper, faster, and less power consumptive devices.

Based on optical design concepts for photographic and microscopy lenses the optical lithography has experienced a fulminant development seen through the last three decades.

The most advanced systems today work at a wavelength of 193nm and are able to achieve resolution of 90nm and below in high volume production.

In this presentation the actual state of the art for these systems and the optical technologies will be shown.

Also recent developments like Immersion Lithography, the trend to shorter wavelength (157nm) and the long-term perspective to EUV-Lithography will be addressed.