Regensburg 2004 – wissenschaftliches Programm
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HL: Halbleiterphysik
HL 8: Photonische Kristalle II
HL 8.3: Vortrag
Montag, 8. März 2004, 15:45–16:00, H15
Photonic crystal templates based on holographic lithography working in a wide spectral range — •C. Enkrich1,2, A. Blanco1,3, K. Busch4,2, and M. Wegener1,3,2 — 1Institut für Angewandte Physik, Universität Karlsruhe (TH), 76128 Karlsruhe — 2DFG-Center for Functional Nanostructures, Universität Karlsruhe (TH), 76131 Karlsruhe — 3Institut für Nanotechnologie, Forschungszentrum Karlsruhe in der Helmholtz-Gemeinschaft, 76021 Karlsruhe — 4Institut für Theorie der Kondensierten Materie, Universität Karlsruhe (TH), 76128 Karlsruhe
The fabrication of three-dimensional photonic crystals is a major challenge in materials science, especially when the periodicity lies in the optical region [1]. Here we present a flexible method based on holographic lithography [2] to fabricate photonic crystal templates. By interference of four laser beams it is possible to create 3D microporous structures in a photosensitive resin (SU-8) arranged in an fcc lattice with the periodicity in the submicron region [3]. By changing experimental parameters it is possible to tune their photonic properties. We show that the polymer filling fraction can be varied from around 20 % to 80 % producing photonic gaps covering a wide spectral range from the visible to the near infrared. Comparison with theoretical calculations allows to optimize the design and therefore the photonic properties. These structures can be used as templates in which materials with a high dielectric constant can be infiltrated to produce full photonic band gap crystals.
[1] For a recent review see C. Lopez, Adv. Mater. 15, 1679 (2003).
[2] M. Campbell et al., Nature 404, 53 (2000).
[3] Yu. V. Miklyaev et al., Appl. Phys. Lett. 82, 1284 (2003).