Regensburg 2004 – wissenschaftliches Programm
O 25.9: Vortrag
Dienstag, 9. März 2004, 17:45–18:00, H39
Growth and morphology of ultrathin nickel films on Cu (001) — •Leif Glaser1, Robert Nietubyć1, Alexander Föhlisch1, Julian Tobias Lau1,2, Michael Martins1, Matthias Reif1, and Wilfried Wurth1 — 1Institut für Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, 22761 Hamburg — 2EPFL, Lausanne, Switzerland
We have studied the Ni L-X-ray Adsorption Fine Structure (XAFS) for thin Nickel films that were evaporated on a Cu(001) substrate. The measurements were made at the Beamline BW3 of the DORIS storage ring at HASYLAB. The coverages ranged from 0.08 to 3.0 layers of Ni and were calibrated by the ratio of Ni L3 to Cu L3 jump height and verified by thermal desorption spectroscopy (TDS). We have found a clear evolution of the XAFS with coverage. Furthermore we observed layer by layer growth of the Nickel thin films. The changes in the x-ray adsorption spectra are in very good agreement with the multiple scattering simulations that were performed alongside the experiment. Surface alloying did not take place upon annealing to 400K while at 450K clear evidence for alloying was observed. Funding for this project by BMBF under contract KS1 GUB/5 is gratefully acknowledged.