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O: Oberflächenphysik
O 28: Postersitzung (Elektronische Struktur, Grenzfläche fest-flüssig, Halbleiteroberflächen und -grenzflächen, Magnetismus und Symposium SYXM, Methodisches, Nanostrukturen, Oberflächenreaktionen, Teilchen und Cluster, Zeitaufgelöste Spektroskopie)
O 28.48: Poster
Mittwoch, 10. März 2004, 16:00–19:00, Bereich C
Plasma CVD-grown carbon nanotubes studied by field emission — •Daniell Malsch1, Martin Sveningsson2, Eleanor Campbell2, and Juergen A. Schaefer1 — 1Institut für Physik und Zentrum für Mikro- und Nanotechnologien, TU Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany — 2Department of Experimental Physics, Gothenburg University and Chalmers University of Technology, 41296 Gothenburg, Sweden
Films of carbon nanotubes show an excellent field emission behaviour that allows a wide range of application in field emitting devices. The influence of the different emission parameters has to be investigated in order to improve their performance. We study the field emission of vertically aligned PCVD-grown multiwall carbon nanotubes. A systematic influence of the tube length on the emission current, the light emission, and the surface temperature of the film is found. We also examine blackbody radiation from resistive heating during field emission. This leads, in agreement with light emission behaviour and long-time stability measurements, to a stepwise degradation of the carbon nanotube films.