Regensburg 2004 – wissenschaftliches Programm

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O: Oberflächenphysik

O 33: Organische Dünnschichten II

O 33.6: Vortrag

Donnerstag, 11. März 2004, 12:30–12:45, H39

Preparation of submicron-structured alkylsiloxane monolayers using prepatterned silicon substrates by laser direct writing — •Nils Hartmann, Thorsten Balgar, and Eckart Hasselbrink — Universität Duisburg-Essen, Fachbereich Chemie, Universitätsstr. 5, 45141 Essen

A new constructive method for the preparation of laterally structured alkylsiloxane monolayers is demonstrated. Laser direct writing has been used to create oxide patterns on H-terminated Si(100) samples under ambient conditions. Depending on the laser power and the writing speed oxide structures with a lateral resolution below 500 nm can be prepared routinely. The patterned samples are suitable as temporary templates for the preparation of laterally structured octadecylsiloxane monolayers. Prior to immersion in an octadecyltrichlorosilane (OTS) solution, however, a hydration of the samples in water is essential to facilitate a selective coating of the oxidized areas. After coating, atomic force microscopy (AFM) reveals the formation of octadecylsiloxane islands exclusively along the oxide lines.

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