Berlin 2005 – wissenschaftliches Programm
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CPP: Chemische Physik und Polymerphysik
CPP 31: Polymer physics: special techniques
CPP 31.5: Vortrag
Mittwoch, 9. März 2005, 10:45–11:00, TU C130
High refractive index hybrid materials for two-photon polymerization for photonic applications — •Pelagie Declerck1, Ruth Houbertz1, Gerhard Domann1, Carsten Reinhardt2, and Boris Chichkov2 — 1Fraunhofer-ISC, Neunerplatz 2,97082 Würzburg — 2Laserzentrum Hannover LZH, Hollerithallee 8, 30419 Hannover
High refractive index inorganic-organic materials were synthesized by hydrolysis/condensation reactions. One or two-photon polymerization processes were applied to organically cross-link the resin. While the resins have to absorb around 365 nm for UV lithography, they have to be transparent near 800 nm for the 2PP process. The latter process allows one to write 3D structures down to the nm scale and at ultra-fast speed. This can be applied for the generation of photonic elements.
In order to increase the refractive index, an in-situ synthesis was developed which links organoalkoxysilane precursors containing UV polymerizable groups and titanium-based precursors. The influence of two different organoalkoxysilane on the resulting optical properties was studied. The properties of the hybrid materials and the resulting layers were investigated. Besides, experiments on the technological processing of the resins were carried out in order to determine their ability to be patterned by UV light and by 2PP processes. The refractive index of the layers was checked after a final curing step at 150∘C. Transparent and high refractive index coatings were obtained (1.8 at 1820 nm).