Berlin 2005 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 23: Postersitzung I

DS 23.29: Poster

Freitag, 4. März 2005, 16:00–18:30, Poster TU B

Reactive sputtering of tungsten nitride: From deposition conditions to structure formation. — •Patrick Karimi, Daniel Severin, and Matthias Wuttig — 1.Physikalisches Institut , Lehrstuhl für Physik neuer Materialien RWTH Aachen, 52056 Aachen

Transition metal oxides and nitrides have attracted considerable interest in the past due to their wide ranging applications. Nevertheless the mechanisms of structure formation are not yet precisely understood. Previous investigations have shown some consistent trends on the structure of IVB-VIB transition metal oxides and nitrides, however no data on tungsten nitride have been available to support our predictions on the mechanisms of structure formation. In this work, tungsten nitride films have been prepared by DC magnetron sputtering under different N2/(N2+Ar) flow rate ratios. Structural investigation shows a mixed phase of W+W2N at flow rate ratios between 5