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Verhandlungen
Verhandlungen
DPG

Berlin 2005 – wissenschaftliches Programm

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MA: Magnetismus

MA 20: Poster:Schichten(1-29),Spintrsp(30-45),Ex-Bias(46-63),Spindyn(64-75),Mikromat.(76-80),Cluster(81-94),Abbv.(95-99),Obflm(100-02),SpElek.(103-09),E-Theo(110-14),Mikromag.(115-16),Spin+PÜ(117-26),Mag.Mat.(127-51),Meth.(152-55),Mol.Mag(156-59),Kondo(160-65

MA 20.20: Poster

Montag, 7. März 2005, 14:00–18:00, Poster TU C

Magnetism of atomic chains, islands and surface alloys of Fe on Pt substrates — •A. Enders1, T.Y. Lee1, J. Honolka1, K. Kuhnke1, D. Repetto1, K. Fauth2, M. Hessler2, G. Schütz2, and K. Kern11MPI für Festkörperforschung, Stuttgart, Germany — 2MPI für Metallforschung, Stuttgart, Germany

The structure and magnetic properties of submonolayer coverages of Fe on Pt substrates have been investigated. By adjusting the preparation conditions and substrate orientation the Fe could be stabilized as atomic chains, flat monolayers, islands or as Fe-Pt surface alloy. Growth mode and structure of the Fe have been investigated under ultrahigh vacuum condition by thermal He-atom scattering (TEAS), low energy electron diffraction (LEED), and scanning tunneling microscopy (STM). The magnetism has been explored in-situ by X-ray magnetic circular dichroism (XMCD). The experiments clearly show a very sensitive dependence of the magnetic properties on the local atomic environment and dimensionality. For the Fe chains we find an oscillating magnetic anisotropy between perpendicular and in-plane direction with increasing chain width. Significantly enhanced magnetic moments and coercive fields are found for the Fe-Pt surface alloy, which is formed on stepped Pt(997) substrates at growth temperatures above 550 K. Element specific XMCD measurements on the alloys revealed an induced magnetic moment in the Pt which is a result of indirect exchange interaction. The comparison of the results underline the potential of stepped substrates for nanostructure fabrication due to their influence on growth mode, structure and magnetism in the thin film limit.

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