Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 36: Postersitzung (Elektronische Struktur, Grenzfl
äche fest-flüssig, Halbleiteroberfl
ächen und -grenzfl
ächen, Nanostrukturen, Oberfl
ächenreaktionen, Teilchen und Cluster, Struktur und Dynamik reiner Oberfl
ächen)

O 36.44: Poster

Montag, 7. März 2005, 15:00–18:00, Poster TU F

Electrical and optical sensors fabricated by thin film fracture — •Mady Elbahri, Shiva Kumar Rudra, Abhijit Biswas, and Rainer Adelung — Lehrstuhl für Materialverbunde, Technische Fakultät der Universität Kiel, Kaiserstrasse 2, 24143 Kiel, Germany

Recently, it was shown how nanowires can be formed by using stress induced cracks in thin films as a template [1]. The fracture of thin films is determined by the strain field. The strain field depends on the design of the film, which can be chosen intentionally to create predetermined breaking points. Such nano structures have the potential to be used as electrical or optical triggered sensors.

The fracture approach is also useful for the generation of thin film cracks in metallic thin films. Those cracks, typically smaller than optical wavelength, show interesting optical properties, making them a promising candidate for optical and sensors applications. Conductivity measurements through nanowire arrays and optical measurement for such nano-cracks will be shown and discussed; also using them for the detection of molecules by means of optical measurement.

[1] R. Adelung, M. Elbahri, O.C. Aktas et al., Nature Materials 3, 375, (2004)