Berlin 2005 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
O: Oberflächenphysik
O 48: Oxide und Isolatoren II
O 48.4: Vortrag
Dienstag, 8. März 2005, 16:30–16:45, TU EB107
Structural Studies of thin VOx films grown on TiO2 using NIXSW — •Emily Kröger1, Francesco Allegretti2, Martin Polcik1, Matthew Knight2, Vin Dhanak3, and Phil Woodruff1,2 — 1Fritz-Haber-Institut, Faradayweg 4-6, 14195, Berlin — 2Department of Physics, University of Warwick, Coventry CV4 7AL, UK — 3Daresbury Laboratory, UK
The aim of this project is to use quantitative structural techniques to obtain information on transition metal oxide surfaces. The Normal Incidence X-Ray Standing Waves (NIXSW) technique is used to investigate the growth of sub-nanometre vanadia films on the rutile titanium dioxide (110) surface. The bulk NIXSW structural parameters for TiO2 have been successfully fitted. Three different Bragg reflections were used to triangulate the V atom positions and epitaxial film growth for vanadia films grown by post-oxidation has been confirmed. The measurements allowed the decrease in film quality with film thickness to be monitored. In addition, a series of experiments on as-deposited sub-monolayer films were completed. Two components in the X-ray photoelectron spectrum of the V 2p suggest two different V species on the surface and this NIXSW study shows that they take different surface positions.