Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 49: Epitaxie und Wachstum II

O 49.8: Vortrag

Dienstag, 8. März 2005, 17:30–17:45, TU EB407

Growth of NiO on Ag(100) Studied by In-Situ X-Ray Scattering — •E. Schierle, E. Weschke, A. Gottberg, and S.R. Krishnakumar — Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, D-14195 Berlin, Germany

The growth of NiO on Ag was studied by specular x-ray diffraction in situ at ID 10 A of the European Synchrotron Radiation Facility, using a small UHV chamber mounted on the diffractometer. Films where prepared by Ni evaporation in oxygen atmosphere, with the substrate held at 500 K. In agreement with earlier results, we find that on Ag(111), layer-by-layer growth occurs only up to ≈ 6 monolayers, while extended growth is observed for Ag(100). On this surface, films were grown with thicknesses of up to 180 monolayers. Pronounced Laue oscillations of the (100) Bragg peak and rocking widths from 0.6 to 1.2 degrees indicate good crystalline quality of the films, particularly at film thicknesses below ≈ 30  monolayers. We observe a gradual change of the lattice parameter from a strained value to the bulk value of NiO.

This work was supported by DFG, Sfb 290 (TPA06).