Berlin 2005 – wissenschaftliches Programm
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P: Plasmaphysik
P 8: Niedertemperaturplasmen / Plasmatechnologie 4
P 8.2: Vortrag
Samstag, 5. März 2005, 09:00–09:15, HU 3038
Plasma Processing and Analysis of ultrathin Carbon-Fluorine Films — •Jakob Barz1,2, Michael Haupt1, Christian Oehr1, Achim Lunk2, and Heinz Hilgers3 — 1Fraunhofer Institut für Grenzflächen- und Bioverfahrenstechnik, Nobelstr. 12, 70569 Stuttgart — 2Institut für Plasmaforschung, Pfaffenwaldring 31, 70569 Stuttgart — 3IBM E&TS EMEA, Mainz
In order to obtain domains or ultrathin coatings of fluorocarbon polymer, substrates are treated in a pulsed radio frequency discharge with a mixture of CHF3 and a carrier gas, e.g. Argon. By varying power, duty cycle as well as pulse duration, the obtained layers differ in their properties, especially concerning surface tension and topographical aspects. In order to find out about the growing mechanisms of the polymer film and the physical properties of the plasma phase, spectroscopic examinations of the plasma are carried out:
- Mass spectroscopy associated with ionization energy measurements allows the determination of molecular species in the plasma phase and their energetic states.
- Laser induced fluorescence (LIF) gives information about a molecular species of interest in the plasma phase with a high time resolution.
- Optical emission spectroscopy (OES), which is also possible with high time resolution, completes the set of plasma characterization methods used. These data are compared to coating properties which are determined by
- contact angle measurements, giving the surface tensions according to the Owens-Wendt equation.
- X-ray photoelectron spectroscopy (XPS) data.
- Atomic Force Microscopy (AFM) measurements.