Augsburg 2006 – scientific programme
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P: Plasmaphysik
P 24: Plasma-Wand Wechselwirkung 3
P 24.5: Talk
Wednesday, March 29, 2006, 15:45–16:00, 1002
Tungsten sputtering and accumulation of implanted carbon and deuterium by simultaneous bombardment with D and C ions — •I. Bizyukov1,2, K. Krieger1, N. Azarenkov2, S. Levchuk1, and C. Linsmeier1 — 1MPI f. Plasmaphysik, EURATOM Assoc., Boltzmannstr. 2, 85748 Garching — 2Kharkiv National University, Faculty of physics and technology, 31 Kurchatov Ave., Kharkiv 61108, Ukraine
Sputtering and implantation processes resulting from simultaneous bombardment of tungsten with deuterium and carbon were investigated in a newly developed dual ion beam experiment. W films were used as a model system and irradiated simultaneously with beams of D3+ ions and of C2− ions. The C-fraction in the incident flux was varied over the full range from pure D to pure C irradiation. The dynamics of W sputtering and accumulation of implanted C and D as a function of the C/D ratio was studied in-situ by ion beam analysis. The experiments show that once stationary conditions are reached, the sputtering of W can be well described by the linear contribution of D and C impact. The equilibrium amount of implanted C, as well as the shape of the C depth profile, remains the same for different C fractions in the incident flux. At incident energies of 3keV (D) and 6keV (C) respectively, stationary conditions are reached at a total fluence <2× 1022m−2. The experimental results, particularly with respect to the transition between continous W erosion and continous C deposition, show significant deviations to simulations using a purely kinematic model of ion interaction. Consequently, chemical interactions between the species, such as carbide formation, must be taken into account for the interpretation of the underlying processes.